세미원 - Semiconductor No.1

▶ 제품 설명

- ENPR는 micromachining 및 microelectronic applications을 위해 설계되고

다양한 표면과의 접착력이 강화된 high contrast, epoxy resin기반의

negative Photoresist 입니다.

◎ High aspect ratio imaging with vertical side walls

◎ Near UV (350-400nm) processing

◎ Film thicknesses from 0.5 to 200µm with single spin coat

◎ Highly chemical and temperature resistance

◎ Improved Adhesion (Si, Glass, Sapphire, Metal)

ENPR Series	Viscosity (cP)	Thickness (um)	Exposure Energy (Broadband, mJ/㎠)
K0.5	2.6	0.47 - 0.88	130 - 140
K1	4.1	0.88 - 1.7	130 - 150
K2	8.2	1.7 - 3.5	130 - 150
K5	53	4.7 - 9	150 - 170
K10	455	9 - 22	170 - 190
K15	1500	14 - 41	170 - 200
K35	8220	26 - 107	180 - 250
K50	15900	44 - 156	200 - 270
K75	27200	67 - 228	220 - 300