▶ 제품 설명
- ENPR는 micromachining 및 microelectronic applications을 위해 설계된
high contrast, epoxy 기반 negative Photoresist 입니다.
◎ High aspect ratio imaging with vertical side walls
◎ Near UV (350-400nm) processing
◎ Film thicknesses from 1.5 to 200µm with single spin coat
◎ Highly chemical and temperature resistance
◎ fully compatible with established SU-8 lithographic processes